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Articles shown here have been peer-reviewed and accepted, which are not yet assigned to volumes /issues, but are citable by Digital Object Identifier (DOI).
Research progress in numerical simulation of atomic layer deposition reactors
ZHANG Hang-bo, YAN Ying-ping, WANG Lin-lin, CHEN Guo-hao, PING Hui-hui, ZHUANG Li-wei
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Research progress on borides growth based on atomic layer deposition technique
CHEN Pengyu, WEN Xintao, HU Zhichen, XI Bin
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Advances in the application of atomic layer deposition in the preparation of optoelectronic devices
DONG Ce, JIANG Ning, WANG Guan-ran, WANG Jia-wei, REN Jian-yang, XIE Si-yu, LI Ye, DUAN Yu
DOI: 10.20027/j.gncq.2025.0017
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